Sputtering Targets

Sputtering Targets
 

Product description:

Our products are four broad categories: industrial purity metals and alloys; variety of high-purity metals and alloys; various metals and alloys sputtering targets; the part of rare earth functional materials products mainly include: metal scandium , yttrium, lanthanum, cerium, praseodymium, neodymium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, lutetium, titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, manganese , iron, cobalt, nickel, copper, silver, gold, zinc, aluminum, indium, tin, and hafnium - iron, titanium - aluminum, yttrium - zirconium, nickel - titanium and titanium - zirconium, aluminum - silicon, aluminum - copper, tungsten - copper, aluminum - boron, aluminum - manganese, aluminum - magnesium, aluminum - zirconium, aluminum - Sc, Al - Nd, La - Ni, Ni - Cr, Ce - Al, Mg - Gd, Mg - Sc, Mg - B , zirconium - vanadium, gadolinium - titanium, cerium - zirconium - yttrium, gadolinium - iron - cobalt, gadolinium - titanium - zirconium, Tb - Fe - Co, Tb - Dy - Fe, Al - Y - Ni - Co, Al - Mg - silicon - molybdenum, aluminum - scandium - Ni - roll - zirconium alloys, and the target of the metal and alloys, functional materials sincerely welcome overseas customers a lot of contact, to strengthen the technical and trade cooperation on the sputtering type coating, can be simple. understood as the use of electronic or high-energy laser bombardment of the target, and the surfaces of the components to form radicals or ions sputtered out, and eventually deposited on the substrate surface, through the film forming process, the final film. Sputtering is divided into many kinds, overall, with different points vapor deposition is sputtering rate will be one of the main parameters of the laser sputtering sputtering pld, compositional uniformity easy to maintain, and the atomic scale The thickness uniformity of the relatively poor (as is the pulse sputtering), the control crystal orientation (outer edge) growth is also more generally pld example, the main factors are: the target and the substrate lattice matching degree of coating atmosphere ( low pressure gas atmosphere) substrate temperature of the laser power pulse frequency sputtering time for different sputtering material and the substrate, the optimum parameters need to be determined experimentally, is not the same, the quality of coating equipment primarily is whether precise temperature control, can ensure good vacuum, can ensure good vacuum chamber cleanliness. Alloy Target manufacturer htpp: //hekui.gongchang.com/