Supply of the metal scandium target | sputtering target manufacturer

Supply of the metal scandium target | sputtering target manufacturer

Product description:

The company supplies rare earth metal scandium target |. Sputtering target manufacturers of quality assurance, welcomed the talks 0752-2610888 / 18933289429.

Huizhou City Tuopu Metal Materials Co., Ltd. ***.

Metal scandium target

Magnetron sputtering is a new way of physical vapor coating, compared to the earlier point of evaporation coating methods, the advantages are obvious in many ways. As has been the development of a more mature technology, magnetron sputtering has been applied in many fields.

Metal scandium target | sputtering target manufacturer Magnetron sputtering principle: in the sputtered target electrode (cathode) applied between the anode and an orthogonal magnetic and electric fields, in a high vacuum chamber filled with inert gas required (usually Ar gas), a permanent magnet in the target material formed on the surface of 250 to 350 gauss, with high voltage electric field composed of orthogonal electromagnetic field. In the electric field, Ar gas ionized into positive ions and electrons, plus there are some negative high voltage on the target, the electron emitted from the target is affected by the magnetic field the role and working gas ionization probability increases in high-density plasma near the cathode is formed, Ar ions accelerated under the action of the Lorentz force toward the target surface, at high speed bombardment of the target surface, so that the target was splashed follow shot to the atomic momentum higher kinetic energy conversion principle from the target surface toward the substrate is deposited by magnetron sputtering deposition is generally divided into two kinds: a tributary of sputtering and RF sputtering, sputtering apparatus which is simple in principle tributary , when the sputtered metal, its rate is also fast. RF sputtering using a wider range, in addition to the conductive material may be sputtered, the sputtering may be a non-conductive material, also prepared by reacting an oxide sputtering Division , nitrides and carbides compound material. If the RF frequency increases after becoming microwave plasma sputtering, now commonly used electron cyclotron resonance (ECR) microwave plasma sputtering.

Metal scandium target | sputtering target manufacturer Magnetron sputtering target:

Metal scandium target | sputtering target manufacturer Metal sputtering targets; alloy sputtering targets; ceramic sputtering targets; boride ceramic sputtering targets; carbide ceramic sputtering targets; fluoride ceramic sputtering targets; nitride ceramic sputtering target; oxide ceramic target; diselenide ceramic sputtering targets; silicide ceramic sputtering targets; sulfide ceramic sputtering targets; telluride ceramic sputtering targets; other ceramic target; doped with chromium oxide silicon ceramic target (Cr-SiO), indium phosphide target (InP), gallium arsenide lead target (PbAs), indium arsenide target (InAs).

Metal scandium target | sputtering target manufacturer High-density high-purity sputtering targets are:

The sputtering target (purity: 99.9% -99.999%)

1. metal targets:

Ni target, Ni, Ti target, Ti, Zn target, Zn, Cr target, Cr, Mg target, Mg, niobium target, Nb, tin target, Sn, Al target, Al, indium target, In, Fe target, Fe, aluminum zirconium target, ZrAl, titanium aluminum targets, TiAl, Zr target, Zr, Al-Si target, AlSi, silicon target, Si, copper target Cu, tantalum target T, a, a germanium target, Ge, silver target, Ag, Co target , Co, gold target, Au, target gadolinium, Gd, the target lanthanum, La, yttrium target, Y, target cerium, Ce, tungsten target, w, stainless steel target, the target nickel-chromium, NiCr, hafnium target, Hf, mammography, Mo, iron-nickel target, FeNi, tungsten target, W and the like.

2. ceramic target

ITO target, target magnesium oxide, iron oxide target, a target of silicon nitride, silicon carbide target, a target of titanium nitride, chromium oxide target, a target of zinc oxide, zinc sulfide target, a target of silicon dioxide, silicon monoxide target, target ceria , zirconia target, niobium pentoxide target, target titania, zirconia target, target hafnium dioxide, titanium diboride target, zirconium diboride target, target tungsten trioxide, aluminum oxide target pentoxide tantalum, niobium pentoxide target, magnesium fluoride target, target yttrium fluoride, zinc selenide target, a target of aluminum nitride, silicon nitride target, the target boron, titanium nitride target, silicon carbide target, niobate lithium target, target praseodymium titanate, barium titanate target, target lanthanum titanate, nickel oxide target, sputtering target and so on.

Metal scandium target | sputtering target manufacturer - Huizhou City Tuopu Metal Materials Co., Ltd.