Guangdong sputtering target manufacturer

Guangdong sputtering target manufacturer
 

Product description:

Guangdong sputtering target manufacturer The product has four broad categories: industrial purity metals and alloys; variety of high-purity metals and alloys; various metals and alloys sputtering targets; the part of rare earth functional materials products mainly include: metal scandium, yttrium, lanthanum, cerium, praseodymium, neodymium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, lutetium, titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, manganese, iron, cobalt, nickel, copper, silver, gold, zinc, aluminum, indium, tin, and hafnium - iron, titanium - aluminum, yttrium - zirconium, nickel - titanium and titanium - zirconium, aluminum - silicon, aluminum - copper, tungsten - copper, aluminum - boron, aluminum - manganese, aluminum - magnesium, aluminum - zirconium, aluminum - Sc, Al - Nd, La - Ni, Ni - Cr, Ce - Al, Mg - Gd, Mg - scandium, magnesium - boron, zirconium - vanadium, gadolinium - titanium, cerium - zirconium - yttrium, gadolinium - iron - cobalt, gadolinium - titanium - zirconium, Tb - Fe - Co, Tb - Dy - Fe, Al - Y - Ni - Co, Al - Mg - silicon - molybdenum, aluminum - scandium - Ni - roll - zirconium alloys, and the target of the metal and alloys, functional materials sincerely welcome overseas customers a lot of contact, to strengthen the technical and trade cooperation on the sputtering type coating, can be simply understood. for the use of electronic or high-energy laser bombardment of the target, and the surfaces of the components to form radicals or ions sputtered out, and eventually deposited on the substrate surface, through the film forming process, the final film.

Guangdong sputtering target manufacturer - Huizhou City Tuopu Metal Materials Co., Ltd.

Sputtering is divided into many kinds, overall, with different points vapor deposition is sputtering rate will be one of the main parameters of the laser sputtering sputtering pld, compositional uniformity easy to maintain, and the atomic scale The thickness uniformity of the relatively poor (as is the pulse sputtering), the control crystal orientation (outer edge) growth is also more generally pld example, the main factors are: the target and the substrate lattice matching degree of coating atmosphere ( low pressure gas atmosphere) substrate temperature of the laser power pulse frequency sputtering time for different sputtering material and the substrate; experiment to determine the optimal parameters required; is not the same; the quality of coating equipment that can be precise temperature control; can ensure good vacuum degree; can ensure good vacuum chamber Cleanliness