The company's stock: Alloy target manufacturers | Hangzhou zinc aluminum target price , Business Consulting: 18933289429 Ho Alloy target manufacturers | Hangzhou zinc aluminum target price
Alloy Target manufacturer - Huizhou City Tuopu Metal Materials Co., Ltd. Alloy Target manufacturer Founded in March 1993, a total investment of 120 million yuan, covers an area of 30,000 square meters, and has a domestic advanced production lines, is a research and development, the production of non-ferrous metals, alloys, various sputtering targets and Functional Materials of the state's key high-tech enterprises. Alloy Target manufacturer Our products are four broad categories: industrial purity metals and alloys; variety of high-purity metals and alloys; various metals and alloys sputtering targets; the part of rare earth functional materials products mainly include: metal scandium , yttrium, lanthanum, cerium, praseodymium, neodymium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, lutetium, titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, manganese , iron, cobalt, nickel, copper, silver, gold, zinc, aluminum, indium, tin, and hafnium - iron, titanium - aluminum, yttrium - zirconium, nickel - titanium and titanium - zirconium, aluminum - silicon, aluminum - copper, tungsten - copper, aluminum - boron, aluminum - manganese, aluminum - magnesium, aluminum - zirconium, aluminum - Sc, Al - Nd, La - Ni, Ni - Cr, Ce - Al, Mg - Gd, Mg - Sc, Mg - B , zirconium - vanadium, gadolinium - titanium, cerium - zirconium - yttrium, gadolinium - iron - cobalt, gadolinium - titanium - zirconium, Tb - Fe - Co, Tb - Dy - Fe, Al - Y - Ni - Co, Al - Mg - silicon - molybdenum, aluminum - scandium - Ni - roll - zirconium alloys, and the target of the metal and alloys, functional materials sincerely welcome overseas customers a lot of contact, to strengthen the technical and trade cooperation. Class sputtering coating, can be simply understood as the use of electronic or high-energy laser bombardment of the target, and the surfaces of the components to form radicals or ions sputtered out, and eventually deposited on the substrate surface, through the film forming process, and ultimately the formation of a film . sputtering is divided into many kinds, overall, with the difference that the vapor deposition sputtering rate will be one of the main parameters of the laser sputtering sputtering pld, compositional uniformity easy to maintain, and atom scale relatively poor thickness uniformity (because it is pulse sputtering), the control crystal orientation (outer edge) are also more general growth in pld, for example, the main factors are: the target and the substrate lattice matching degree of coating atmosphere (low-pressure gas atmosphere) substrate temperature of the laser power pulse frequency sputtering time for different sputtering material and substrate parameters need to experiment to determine the best, is not the same, the quality of coating equipment primarily is whether the precise temperature control , can ensure good vacuum, can ensure good vacuum chamber cleanliness.